| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus that can efficiently prevent the attachment of a reactive product to the inner surface of a viewport and allows reliable optical observations and measurements by a laser light, etc. by reliably suppressing the effect by an air flow. SOLUTION: In a wall 13b of a flow channel 13 that is opposite to a substrate, a through-hole 13c is formed that serves as an optical path to be used when optically observing the substrate surface via the viewport 20. Between the wall opposite to the substrate and the inside surface of a chamber, a cooling means 24 having an optical path section 24a is disposed. Between the cooling means and the wall opposite to the substrate, a purge gas channel 25 is provided. Also, a purge gas introduction means 25a is provided for causing a purge gas P to flow into the purge gas channel, in the same direction as the direction of the flow of a material gas A inside the flow channel, at the substantially same speed and same pressure as the material gas A, and in a laminar flow. COPYRIGHT: (C)2011,JPO&INPIT |
