| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for enabling accurate microfabrication by suppressing the LER of a resist without causing a significant increase in dielectric constant and drastic deterioration in insulation properties. SOLUTION: A pattern forming method is configured to process a resist into a prescribed pattern by post-baking after exposure and development. The post-baking includes first post-baking and second post-baking executed after the first post-baking. The temperature of the second post-baking is higher than that of the first post-baking. COPYRIGHT: (C)2011,JPO&INPIT |
