发明名称 GROUP-III NITRIDE STRUCTURE AND METHOD FOR PRODUCING A GROUP-III NITRIDE STRUCTURE
摘要 A group-III nitride structure includes a substrate 102 and a fine wall-shaped structure 110 disposed to stand on the substrate 102 in a vertical direction relative to a surface of the substrate 102 and extending in an in-plane direction of the substrate 102. The fine wall-shaped structure 110 contains a group-III nitride semiconductor crystal, and h is larger than d assuming that the height of the fine wall-shaped structure 110 is h and the width of the fine wall-shaped structure 110 in a direction perpendicular to the height direction and the extending direction is d.
申请公布号 US2010252836(A1) 申请公布日期 2010.10.07
申请号 US20080744648 申请日期 2008.11.26
申请人 SOPHIA SCHOOL CORPORATION 发明人 KISHINO KATSUMI;KIKUCHI AKIHIKO
分类号 H01L29/20;H01L21/20;H01L29/06;H01L33/00;H01L33/16;H01L33/20 主分类号 H01L29/20
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