| 摘要 |
A method for producing a thin film laminated capacitor that makes it possible to reduce the number of operations for etching its electrode layers and its dielectric layers. On a substrate, a capacitor part is formed wherein n electrode layers and (n−1) dielectric layers are alternately laminated onto each other, wherein n is 4 or more. The capacitor part is etched from the same side k times. In any ith etching operation, through holes are formed in an amount corresponding to respective ai layers of the electrode layers and the dielectric layers. At least one of ai's is set to 2 or more, and k is made smaller than n−1, thereby making it possible to make the 2nd to nth layers of the electrode layers from the etching starting side exposed at the bottom surfaces of the through holes.
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