发明名称 |
METHOD OF MANUFACTURING SUBSTRATE PRODUCT HAVING NITRIDE BASED COMPOUND SEMICONDUCTOR LAYER ON SUPPORT SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for choosing a substrate suitable for a desired semiconductor device, in a method including a process of sticking heterogeneous substrates in order to manufacture a substrate product having a nitride based compound semiconductor layer on a support substrate. <P>SOLUTION: A surface layer of a first substrate 10 consisting of a nitride based compound semiconductor, and a surface 20a of a second substrate 20 consisting of a material different from that of the nitride based compound semiconductor are mutually joined. A nitride based compound semiconductor layer 30 is formed on the second substrate 20 by removing other parts, while leaving in the shape of a layer a part containing the surface layer out of the first substrate 10. The second substrate 20 is peeled off from the nitride based compound semiconductor layer 30, after mutually joining a surface 30a of the nitride based compound semiconductor layer 30 to a surface 40a of a support substrate 40 consisting of a material different from both of the nitride based compound semiconductor layer 30 and the second substrate 20. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010226023(A) |
申请公布日期 |
2010.10.07 |
申请号 |
JP20090074220 |
申请日期 |
2009.03.25 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
MAEDA YOKO;YAGO AKIHIRO;MATSUMOTO NAOKI;SATO FUMITAKA |
分类号 |
H01L21/02;H01L21/20;H01L21/205;H01L21/265;H01L33/32 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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