发明名称 METHOD OF MANUFACTURING SUBSTRATE PRODUCT HAVING NITRIDE BASED COMPOUND SEMICONDUCTOR LAYER ON SUPPORT SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for choosing a substrate suitable for a desired semiconductor device, in a method including a process of sticking heterogeneous substrates in order to manufacture a substrate product having a nitride based compound semiconductor layer on a support substrate. <P>SOLUTION: A surface layer of a first substrate 10 consisting of a nitride based compound semiconductor, and a surface 20a of a second substrate 20 consisting of a material different from that of the nitride based compound semiconductor are mutually joined. A nitride based compound semiconductor layer 30 is formed on the second substrate 20 by removing other parts, while leaving in the shape of a layer a part containing the surface layer out of the first substrate 10. The second substrate 20 is peeled off from the nitride based compound semiconductor layer 30, after mutually joining a surface 30a of the nitride based compound semiconductor layer 30 to a surface 40a of a support substrate 40 consisting of a material different from both of the nitride based compound semiconductor layer 30 and the second substrate 20. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010226023(A) 申请公布日期 2010.10.07
申请号 JP20090074220 申请日期 2009.03.25
申请人 SUMITOMO ELECTRIC IND LTD 发明人 MAEDA YOKO;YAGO AKIHIRO;MATSUMOTO NAOKI;SATO FUMITAKA
分类号 H01L21/02;H01L21/20;H01L21/205;H01L21/265;H01L33/32 主分类号 H01L21/02
代理机构 代理人
主权项
地址