| 摘要 |
PURPOSE: A method and an apparatus for transferring the precursor to epitaxial reactors at the steam vapor step are provided to adjust the total pressure by discharging a part of the gas stream using a pressure release valve. CONSTITUTION: An evaporation vessel(15) comprises a liquid precursor(16). The carrier gas is offered in the evaporation vessel through a supply line(22). A gas control method is connected to a carrier gas entrance(17). A gas outlet line(24) comprises a pressure transducer(26), a concentration change(28) and a pressure release valve(32). |
