发明名称 PHOTO DIODE CELL STRUCTURE OF PHOTO DIODE INTEGRATED CIRCUIT FOR OPTICAL PICKUP AND METHOD THEREOF
摘要 PURPOSE: A photo diode cell structure of a photo sensor IC is provided to reduce the size of a photo sensor by narrowly and shallowly doping a high concentration impurity which is an opposite type to light receiving regions. CONSTITUTION: A second type epitaxial layer(203) is located on a first type substrate(201). A plurality of high concentration second type layers are formed on the second type epitaxial layer with a shallow depth. A high concentration first type layer(207) is located on the second type epitaxial layer. The high concentration first type layer is formed between a plurality of high concentration second type layers with a narrow and shallow depth. The width of the high concentration first type layer is less than 1um.
申请公布号 KR20100107995(A) 申请公布日期 2010.10.06
申请号 KR20090026412 申请日期 2009.03.27
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 JEONG, HA WOONG;KWON, KYOUNG SOO;GO, CHAE DONG;PARK, DEUK HEE
分类号 H01L27/14 主分类号 H01L27/14
代理机构 代理人
主权项
地址