PURPOSE: A formation method of an information storage pattern is provided to improve the electrical property of a phase variation memory device by uniformly maintaining the resistance value of a memory cell. CONSTITUTION: A semiconductor substrate(10) comprises an active layer(20). An interlayer insulating layer(30) is formed on the semiconductor substrate. The interlayer insulating layer comprises an opening(35) which exposes a transistor or a diode. A bottom electrode(40) is formed in the opening of the interlayer insulating layer. The bottom electrode is formed in order to partly fill the opening of the interlayer insulating layer.
申请公布号
KR20100108001(A)
申请公布日期
2010.10.06
申请号
KR20090026420
申请日期
2009.03.27
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
LEE, JIN IL;VLADIMIR URAZAEV;JEONG, JIN HA;SHIN, SEUNG BACK;CHO, SUNG LAE;AN, HYEONG GEUN;IM, DONG HYUN;KIM, JUNG HYEON