| 摘要 |
Provided is an exposure method wherein a mask pattern is reduced in sizes. The exposure method for exposing a plate includes an illuminating step of periodically performing pulse irradiation of illuminating light to pattern regions (A1-A4) of a mask (MA) whereupon a pattern having periodicity in an X direction is formed and exposing the plate to the illuminating light through the pattern; and a shift step of shifting the plate in a shift direction which corresponds to the X direction, in accordance with the pattern period of the pattern in the X direction, in each period of the pulse irradiation of the illuminating light. |
