| 摘要 |
Provided is a sputtering target for a magnetic recording film, in which film formation efficiency and film characteristics can be improved by suppressing growth of crystal grains, reducing magnetic permeability, and increasing density. A method for manufacturing such a sputtering target is also provided. The sputtering target is composed of a matrix phase which includes Co and Pt and a metal oxide phase for example. The sputtering target has a magnetic permeability in the range of 6 to 15 and a relative density of 90% or more.
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