发明名称 EXCIMER LAMP
摘要 PROBLEM TO BE SOLVED: To provide an excimer lamp for efficiently radiating the ultraviolet light of a wave length region of 300-380 nm of a wave length required for polymerizing monomers, for providing an optimal light source for PSA use. SOLUTION: This excimer lamp has a discharge vessel with discharge gas sealed therein including krypton gas, iodine gas and xenon gas, and a pair of electrodes oppositely arranged by sandwiching a discharge space formed inside the discharge vessel. Both of light emission having a peak wave length in the vicinity of 342 nm emitted by excimer I<SB>2</SB><SP>*</SP>of iodine and light emission having a peak wave length in the vicinity of 320 nm emitted by excimer XeI<SP>*</SP>of a compound of xenon Xe and iodine I, are generated in the discharge space. COPYRIGHT: (C)2010,JPO&amp;INPIT
申请公布号 JP2010218804(A) 申请公布日期 2010.09.30
申请号 JP20090062664 申请日期 2009.03.16
申请人 USHIO INC 发明人 MORIMOTO YUKIHIRO;MATSUZAWA SOJI
分类号 H01J65/00;H01J61/16 主分类号 H01J65/00
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