| 摘要 |
PROBLEM TO BE SOLVED: To suppress a deflection error associated with blanking of a charged particle beam, and to improve drawing accuracy. SOLUTION: This charged particle beam drawing device for drawing a desired pattern on a sample includes: a charged particle beam source 11 for generating a charged particle beam; a lens system 21, 22, 23 for focusing the charged particle beam 12 generated by the charged particle beam source 11 on a sample surface 14; a blanking deflector 41 for controlling the arrival of the beam on the sample surface 14; a blanking deflection control circuit 51 for supplying a blanking signal to the blanking deflector 41; and a blanking correction mechanism for correcting a deflection error associated with blanking deflection in response to at least one of the waveform, the frequency, the time ratio and the shot time of the blanking signal. COPYRIGHT: (C)2010,JPO&INPIT
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