发明名称 LATERAL MOSFET WITH SUBSTRATE DRAIN CONNECTION
摘要 In one form a lateral MOSFET includes an active gate positioned laterally between a source region and a drain region, the drain region extending from an upper surface of a monocrystalline semiconductor body to a bottom surface of the monocrystalline semiconductor body, and a non-active gate positioned above the drain region. In another form the lateral MOSFET includes a gate positioned laterally between a source region and a drain region, the drain region extending from an upper surface of a monocrystalline semiconductor body to a bottom surface of the monocrystalline semiconductor body, the source region and the drain region being of a first conductivity type, a heavy body region of a second conductivity type in contact with and below the source region, and the drain region comprising a lightly doped drain (LDD) region proximate an edge of the gate and a sinker extending from the upper surface of the monocrystalline body to the bottom surface of the monocrystalline semiconductor body.
申请公布号 WO2010080296(A3) 申请公布日期 2010.09.30
申请号 WO2009US67151 申请日期 2009.12.08
申请人 FAIRCHILD SEMICONDUCTOR CORPORATION;GREBS, THOMAS, E.;DOLNY, GARY, M.;KINZER, DANIEL, M. 发明人 GREBS, THOMAS, E.;DOLNY, GARY, M.;KINZER, DANIEL, M.
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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