发明名称 METHOD OF DEPOSITING AMORPHOUS HYDROCARBON NITRIDE (a-CN:Hx) FILM, ORGANIC EL DEVICE, AND PROCESS FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an organic device including an a-CN:Hx film by stably forming an a-CN:H<SB>x</SB>film containing carbon-nitrogen (C-N) bonds and having few defects to have satisfactory properties, by a method in which a high-density plasma having a relatively low electron temperature is used, using, as a feed gas, a hydrocarbon compound containing a carbon-nitrogen (C-N) bond. SOLUTION: The hydrocarbon compound containing a C-N bond and either nitrogen or ammonia are used as feed gases to deposit a luminescent layer 12. A hole injection/transportation layer 11 is formed on the underside of the luminescent layer 12, and an electron injection layer 13 is formed on the upper side of the luminescent layer 12. Thus, an organic device including an amorphous hydrocarbon nitride (a-CN:H<SB>x</SB>) film as the luminescent layer is obtained. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010219112(A) 申请公布日期 2010.09.30
申请号 JP20090061175 申请日期 2009.03.13
申请人 TOKYO ELECTRON LTD 发明人 ISHIKAWA HIROSHI
分类号 H01L51/50;C09K11/00;C09K11/08;C09K11/65;H05B33/10 主分类号 H01L51/50
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