REFLECTANCE DISTRIBUTION CURVE MODELING METHOD, THICKNESS MEASUREMENT SCHEME AND THICKNESS MEASUREMENT REFLECTOMETER USING SAME

摘要

The reflectance distribution curve modeling method of the present invention is for modeling a reflectance distribution of a thin film layer according to a change in the wavelength of light with respect to a thin film layer having a uniform thickness, and comprises: a reflectance distribution curve preparation step whereby a reflectance distribution curve is prepared to represent reflectance distribution of the thin film layer according to a change in wavelength of light; an input intensity setting step whereby an intensity distribution curve is prepared to represent intensity of light in a certain wavelength band around a specific wavelength for which white light was band-passed, and then the intensity distribution curve is integrated within the wavelength band to set as an input intensity of the specific wavelength; an output intensity setting step whereby a combined intensity distribution curve of the reflectance and intensity distribution curves is integrated within the wavelength band to set an output intensity of the specific wavelength; an integrated reflectance setting step whereby a value obtained by dividing the output intensity of the specific wavelength by the input intensity of the specific wavelength is set as an integration reflectance of the thin film layer for the specific wavelength; and an integration reflectance distribution curve generating step whereby an integration reflectance distribution curve for reflecting the integration reflectance distribution according to a change in wavelength is generated by repeating the input intensity setting step, the output intensity setting step and the integration reflectance setting step, while changing the specific wavelength.