| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating apparatus by which a substrate is not affected by a coating liquid discharged to the outside of the substrate when coating the coating liquid to the substrate. SOLUTION: The coating apparatus includes a nozzle, a stage, a nozzle moving mechanism, a liquid receiving part, and a gas supply mechanism. The nozzle discharges the coating liquid from the distal end part. The substrate is mounted on the upper surface of the stage, and the nozzle moving mechanism reciprocates the nozzle in the direction of crossing the stage surface in the space on the stage. When the nozzle moving mechanism moves the nozzle while discharging the coating liquid by the nozzle to a position off the stage along the crossing direction, the liquid receiving part receives the coating liquid discharged from the nozzle to the outside of the stage. In such a state that the nozzle moving mechanism moves the nozzle while discharging the coating liquid by the nozzle from the position on the liquid receiving part onto the stage along the crossing direction at least, the gas supply mechanism supplies a prescribed gas to the space to be the rear of the nozzle relative to the moving direction of the nozzle. COPYRIGHT: (C)2010,JPO&INPIT |
