发明名称 METHOD OF FORMING COATING-TYPE FILM
摘要 An aspect of the present invention, there is provided a method for providing a coating-type film, including, coating a solution including an organic metal compound on a surface of a substrate including a semiconductor substrate to form a coating film, heating the coating film to volatize a solvent in the coating film, and performing a treatment including at least one of a heat treatment, an ozone treatment and a moisture treatment to remove impurities from the coating film.
申请公布号 US2010248474(A1) 申请公布日期 2010.09.30
申请号 US20100730638 申请日期 2010.03.24
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SATO KATSUHIRO
分类号 H01L21/3205;B05D3/00;B05D3/02;B05D3/04;B05D3/12;B05D5/00 主分类号 H01L21/3205
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