| 发明名称 |
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE |
| 摘要 |
Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.
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| 申请公布号 |
US2010243950(A1) |
申请公布日期 |
2010.09.30 |
| 申请号 |
US20090678058 |
申请日期 |
2009.05.27 |
| 申请人 |
HARADA DAIJITSU;TAKEUCHI MASAKI;SHIBANO YUKIO;UEDA SHUHEI;WATABE ATSUSHI |
发明人 |
HARADA DAIJITSU;TAKEUCHI MASAKI;SHIBANO YUKIO;UEDA SHUHEI;WATABE ATSUSHI |
| 分类号 |
C09K13/02;B24B37/00;C09K13/00 |
主分类号 |
C09K13/02 |
| 代理机构 |
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