发明名称 |
RESIST COMPOSITION, RESIST LAYER, IMPRINTING METHOD, PATTERN FORMATION, METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM |
摘要 |
To provide a resist composition including: at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.; a fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater; and a fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.
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申请公布号 |
US2010247970(A1) |
申请公布日期 |
2010.09.30 |
申请号 |
US20100731308 |
申请日期 |
2010.03.25 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
OMATSU TADASHI |
分类号 |
G11B5/00;B29C59/00;B32B3/10;C08L33/04;G11B5/84 |
主分类号 |
G11B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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