发明名称 RESIST COMPOSITION, RESIST LAYER, IMPRINTING METHOD, PATTERN FORMATION, METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM
摘要 To provide a resist composition including: at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.; a fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater; and a fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.
申请公布号 US2010247970(A1) 申请公布日期 2010.09.30
申请号 US20100731308 申请日期 2010.03.25
申请人 FUJIFILM CORPORATION 发明人 OMATSU TADASHI
分类号 G11B5/00;B29C59/00;B32B3/10;C08L33/04;G11B5/84 主分类号 G11B5/00
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