| 摘要 |
PROBLEM TO BE SOLVED: To provide a system and a method for treating a substrate reducing power consumption without sacrificing throughput. SOLUTION: The system for treating a substrate 10 includes: a transport part 15; a first treatment chamber 16; a second treatment chamber 18; and a main control part 30. The transport part 15 includes a transport robot 22 for transporting a workpiece 20. The first treatment chamber 16 and the second treatment chamber 18 are arranged around the transport part 14. The first treatment chamber 16 and the second treatment chamber 18 include doors 162, 182 openable/closable in carrying in/out the workpiece 20, respectively. The main control part 30 controls the operations of the transport robot 22 and the doors 162, 182 so that the transport robot 22 alternately accesses the first treatment chamber 16 and the second treatment chamber 18 without continuously accessing either of them. COPYRIGHT: (C)2010,JPO&INPIT |
