发明名称 DEFECT ANALYSIS METHOD OF SILICON SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a defect analysis method of a silicon single crystal, by which distribution of crystal defects in a silicon single crystal can be easily analyzed even in pulling a silicon single crystal by MCZ (Magnetic Czochralski) method in which a magnetic field is applied in a horizontal direction. SOLUTION: The method includes a step S2 of calculating convection in a crucible, where a convection of a silicon melt is calculated by a lamellar flow model using adjusted physical properties of the silicon melt. In the step, convection of the silicon melt is calculated on a plane having two-dimensional axial symmetry, the plane symmetric with respect to the rotation axis of the silicon single crystal. Thereby, the number of meshes is significantly reduced compared to a calculation by a conventional three-dimensional convection model. For example, convection of a silicon melt can be calculated in about one day even for a silicon single crystal having a diameter of about 310 mm. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010215460(A) 申请公布日期 2010.09.30
申请号 JP20090065180 申请日期 2009.03.17
申请人 SUMCO CORP 发明人 NISHIMOTO MANABU;FUJIWARA TOSHIYUKI;SUEWAKA RYOTA
分类号 C30B29/06 主分类号 C30B29/06
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