发明名称 |
METHOD FOR INSPECTING AND JUDGING PHOTOMASK BLANK OR INTERMEDIATE THEREOF |
摘要 |
A photomask blank having a film on a substrate is inspected by (A) measuring a surface topography of a photomask blank having a film to be inspected for stress, (B) removing the film from the photomask blank to provide a treated substrate, (C) measuring a surface topography of the treated substrate, and (D) comparing the surface topography of the photomask blank with the surface topography of the treated substrate, thereby evaluating a stress in the film.
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申请公布号 |
US2010246932(A1) |
申请公布日期 |
2010.09.30 |
申请号 |
US20100750023 |
申请日期 |
2010.03.30 |
申请人 |
INAZUKI YUKIO;KANEKO HIDEO;YOSHIKAWA HIROKI |
发明人 |
INAZUKI YUKIO;KANEKO HIDEO;YOSHIKAWA HIROKI |
分类号 |
G06K9/00;G03F1/32;G03F1/60;G03F1/68 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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