| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device for creating a mask pattern for creating layout design data capable of improving a data ratio. <P>SOLUTION: The device 1 for creating a mask pattern includes a measuring unit 3 and a changing unit 4. The measuring unit 3 measures the distance between a dummy pattern and the other pattern based on the layout design data including an element pattern constituting the circuit element of a semiconductor device and a dummy pattern not constituting the circuit element. The changing unit 4 changes the layout design data in such a manner that, when the distance measured by the measuring unit 3 is longer than a preliminarily designated value, the dummy pattern regulating the distance is enlarged to reduce the distance. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
