发明名称 |
MASK CLEANING DEVICE FOR ORGANIC EL, APPARATUS FOR MANUFACTURING DISPLAY FOR ORGANIC EL, DISPLAY FOR ORGANIC EL, AND MASK CLEANING METHOD FOR ORGANIC EL |
摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a high degree of cleaning while removing a vapor deposition substance in a complete non-contact state to a substrate when cleaning is performed to remove the vapor deposition substance sticking to a mask for an organic EL. Ž<P>SOLUTION: A mask cleaning device for an organic EL is used for removing a vapor deposition substance 61 sticking to a mask 1 for the organic EL, and includes: a mask lifting unit 42 for holding the mask 1 for the organic EL in a standing state; a laser scanning part 11 for scanning a laser light to a portion or the whole area of the mask 1 for the organic EL from a horizontal direction; an air supply nozzle 53 for forming an air flow AF directed to the scanning surface 1S side from the rear surface 1R side in each opening part 3 of the mask 1; and a suction nozzle 63 which is arranged at a part lower than the laser light scanning position and has a suction slit 62S directed obliquely upward to suck in a released substance 62 scattered from the mask 1 for the organic EL during cleaning by the laser scanning part 11. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010215981(A) |
申请公布日期 |
2010.09.30 |
申请号 |
JP20090065482 |
申请日期 |
2009.03.18 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
KATAGIRI KENJI;YUMIBA KENJI;IZAKI MAKOTO |
分类号 |
C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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