| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography technique used to fabricate a positive-type imprint. <P>SOLUTION: The invention concerns a device where imprint molds are formed in three dimensions and includes: at least a substrate which is provided with at least one alternate layers each having at least one portion perpendicular to its top surface, the alternate layers each consisting of a first-type material or a second-type material allowed to be selectively etched with respect to each other; and a surface topology which has (a) at least the first patterns whose top lies at the first level relative to the top surface of the substrate located at either side of the topology, and these first patterns are made of the first-type material and (b) at least the second patterns which have at least the second level relative to the top surface of the substrate and are different from and lower than the first level, and these second patterns are made of the second-type material. <P>COPYRIGHT: (C)2010,JPO&INPIT |
