发明名称 MOUNTING STAND STRUCTURE AND PLASMA FILM FORMING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a mounting stand structure which is put in a high-vacuum state by sufficiently performing degassing treatment in a treatment container, and has endurance for high temperature. SOLUTION: A mounting stand structure 32 for mounting a work W in order to form a thin film containing metal with respect to the work is provided with: a ceramic mounting stand 38 with an electrode 34 for chucking and a heater 36 embedded inside; a metallic flange 100 connected to the lower surface of a circumferential part of the mounting stand; a metallic base 42 which is joined with the flange by screws 126 and also has cooling passages 40 inside for allowing a cooling medium to flow; and a metallic sealing member 130 held between the flange and the base. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010219354(A) 申请公布日期 2010.09.30
申请号 JP20090065236 申请日期 2009.03.17
申请人 TOKYO ELECTRON LTD 发明人 FUJISATO TOSHIAKI;RONALD NASMAN
分类号 H01L21/683;C23C14/50 主分类号 H01L21/683
代理机构 代理人
主权项
地址