发明名称 SURFACE REFORMING METHOD AND SURFACE REFORMING MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a surface reforming method wherein a hydrophilic group can be introduced into the surface of a material with high density; and to provide a surface reforming material of which the surface is reformed using the surface reforming method. SOLUTION: The surface reforming method includes the steps of: forming a film, including a silicone resin having a silanol group and having water contact angle of 3°or more but 8°or less and a thickness of 10 nm or more but 1μm or less, on the surface of the material; and reacting a hydrophilization agent having a functional group capable of generating a silanol group by hydrolysis and/or a silanol group with the material on which the film is formed. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010215702(A) 申请公布日期 2010.09.30
申请号 JP20090061167 申请日期 2009.03.13
申请人 SHISEIDO CO LTD 发明人 TAKEI KEIGO
分类号 C08J7/12 主分类号 C08J7/12
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