发明名称 METHOD FOR TRANSFERRING THIN LAYERS OF MONOCRYSTALLINE MATERIAL ONTO DESIRABLE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To achieve a method for transferring monocrystalline thin layers from a first monocrystalline substrate onto a second substrate with a reduced requirement with respect to the hydrogen dose needed for layer splitting. SOLUTION: The method for transferring monocrystalline thin layers from the first monocrystalline substrate onto the second substrate carries out co-implantation of hydrogen-trap inducing ions with hydrogen ions, the high temperature implantation of hydrogen, and their combination. Then, heat-treatment is applied to weaken the connection between the implanted layer and the rest of the first substrate. Moreover, a strong bond is formed between the implanted first substrate and the second substrate. Finally, another heat-treatment is applied to split the monocrystalline thin layer from the rest of the first substrate by forming and growing hydrogen filled microcracks. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010219566(A) 申请公布日期 2010.09.30
申请号 JP20100153076 申请日期 2010.07.05
申请人 MAX PLANCK G ZUR FOERDERUNG WISSENSCHAFT EV 发明人 GOESELE ULRICH;TONG QUIN-YI
分类号 H01L21/02;H01L21/76;H01L21/20;H01L21/265;H01L21/762;H01L27/12 主分类号 H01L21/02
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