VAPORIZER, SUBSTRATE TREATMENT DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To uniformly form a passage width of a carrier gas ejection part throughout the carrier gas ejection part. SOLUTION: The vaporizer includes: a vaporizing chamber for vaporizing a liquid material; a heater for heating the inside of the vaporizing chamber; a spray nozzle for spraying the liquid material into the vaporizing chamber; and a member for forming a carrier gas ejection part, which covers a portion of a surface of a tip part of the spray nozzle to form a carrier gas ejection part for spraying a carrier gas into the vaporizing chamber from a periphery of the tip part of the spray nozzle. A through-hole for housing the tip part of the spray nozzle therein is formed on the member for forming a carrier gas ejection part, and a plurality of projecting parts in contact with the tip part of the spray nozzle are formed at a plurality of parts on an inner wall surface of the through-hole. COPYRIGHT: (C)2010,JPO&INPIT