发明名称 FILM FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a film forming method wherein sticking matters generated when an epitaxial film is formed on a substrate are efficiently removed. SOLUTION: While the substrate W is supported by a supporting auxiliary member 20, the epitaxial film is formed on the substrate W. Then the substrate W on which the film is formed is removed from the supporting auxiliary member 20, and the front and rear of the supporting auxiliary member 20 are turned over. Then the front surface of the supporting auxiliary member 20, where the sticking matters 310 is formed at the peripheral part thereof, is turned to the rear surface side, and an unprocessed substrate W is mounted on the front surface side. Then an etching gas is sprayed to the supporting auxiliary member 20 mounted with the unprocessed substrate W from the lower surface side with the sticking matters 310, to remove the sticking matters. Then spraying of the etching gas is stopped to form the epitaxial film on the unprocessed substrate W. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010219317(A) 申请公布日期 2010.09.30
申请号 JP20090064629 申请日期 2009.03.17
申请人 NUFLARE TECHNOLOGY INC 发明人 YAJIMA MASAMI;MORIYAMA YOSHIKAZU;ISHII SHIGEAKI
分类号 H01L21/205;C23C16/24;C23C16/44 主分类号 H01L21/205
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