METHODS FOR IN-SITU CHAMBER CLEANING PROCESS FOR HIGH VOLUME MANUFACTURE OF SEMICONDUCTOR MATERIALS,申请号EP20080868108-传众专利搜索

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发明名称	METHODS FOR IN-SITU CHAMBER CLEANING PROCESS FOR HIGH VOLUME MANUFACTURE OF SEMICONDUCTOR MATERIALS
摘要
申请公布号	EP2231898(A2)	申请公布日期	2010.09.29
申请号	EP20080868108	申请日期	2008.12.05
申请人	S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES	发明人	ARENA, CHANTAL;WERKHOVEN, CHRISTIAAN, J.;BERTRAM, JR., RONALD, THOMAS;JOHNSON, ANDREW, D.;VORSA, VASIL;RIDGEWAY, ROBERT, GORDON;MAROULIS, PETER, J.
分类号	C23C16/52;C23C16/54;H01L21/00	主分类号	C23C16/52
代理机构		代理人
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