SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

PURPOSE: A semiconductor device and a manufacturing method thereof are provided to improve the performance of the semiconductor device by forming a capacitor with high capacitance. CONSTITUTION: A semiconductor device includes bottom electrodes, a first support member pattern(155), and a dielectric layer(145). The bottom electrodes are arranged in a second direction which is vertical to a first direction. The first support member pattern is higher than the upper side of the bottom electrode and connects the adjacent bottom electrodes. A dielectric layer is formed on the bottom electrodes and the first support member pattern.