发明名称 |
METHOD FOR PRODUCING HYDROPHOBILIZED POROUS FILM |
摘要 |
<p>A process for manufacturing a hydrophobized microporous film includes: forming an organic silica insulating film 2 on a substrate 1; supplying a gaseous mixture 3 composed of a silylation gas and an inert gas in an apparatus having the substrate 1 disposed therein at a temperature of the substrate 1, the substrate 1 having the organic silica insulating film 2 formed thereon, and said temperature being equal to or higher than a dew point temperature of the silylation gas and equal to or lower than a vaporizing temperature of the silylation gas; stopping the supply of the gaseous mixture 3 into the apparatus; and heating the substrate having the organic silica insulating film 2 formed thereon, so that a hydrophobizing organic silica insulating film, in which the surface of the organic silica insulating film 2 and the surfaces of the pores are hydrophobized, can be obtained with reduced increase in the specific dielectric constant.</p> |
申请公布号 |
EP2197024(A4) |
申请公布日期 |
2010.09.29 |
申请号 |
EP20080836263 |
申请日期 |
2008.09.29 |
申请人 |
NEC ELECTRONICS CORPORATION;ULVAC, INC. |
发明人 |
CHIKAKI, SHINICHI;NAKAYAMA, TAKAHIRO |
分类号 |
H01L21/316;H01L21/3105;H01L21/312;H01L21/768;H01L23/522 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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