发明名称 |
METHOD FOR LOCAL ETCHING OF THE SURFACE OF A SUBSTRATE |
摘要 |
<p>The invention relates to a method for the local etching of the surface of a substrate, characterized in that it comprises: a) making a gas-pervious polymer pad that comprises three-dimensional patterns on one surface thereof; b) contacting the surface including the pad patterns with the substrate; c) submitting the pad/substrate assembly to a plasma so that the species present in the plasma are accelerated and diffused through the pad until they reach the substrate.</p> |
申请公布号 |
EP2232532(A2) |
申请公布日期 |
2010.09.29 |
申请号 |
EP20080872521 |
申请日期 |
2008.12.23 |
申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
发明人 |
JALABERT, LAURENT |
分类号 |
H01L21/033;H01L21/3065;H01L21/308;H01L21/3105;H01L21/311 |
主分类号 |
H01L21/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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