发明名称 Amorphous oxide and thin film transistor
摘要 The present invention relates to an amorphous oxide and a thin film transistor using the amorphous oxide. In particular, the present invention provides an amorphous oxide having an electron carrier concentration less than 10 18 /cm 3 , and a thin film transistor using such an amorphous oxide. In a thin film transistor having a source electrode 6, a drain electrode 5, a gate electrode 4, a gate insulating film 3, and a channel layer 2, an amorphous oxide having an electron carrier concentration less than 10 18 /cm 3 is used in the channel layer 2.
申请公布号 EP2226847(A3) 申请公布日期 2010.09.29
申请号 EP20100006629 申请日期 2005.02.28
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY 发明人 HOSONO, HIDEO;HIRANO, MASAHIRO;OTA, HIROMICHI;KAMIYA, TOSHIO;NOMURA, KENJI
分类号 H01L29/786;G02F1/1345;G02F1/1368;H01L21/363;H01L21/77;H01L21/84 主分类号 H01L29/786
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