发明名称 PROXIMITY EXPOSURE APPARATUS, METHOD FOR DETERMINING A SUBSTRATE POSITION IN THE PROXIMITY EXPOSURE APPARATUS AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE
摘要 <p>PURPOSE: A proximity exposure apparatus, a method for determining the substrate location of the same, and a method for manufacturing a display panel substrate are provided to precisely perform a pattern printing operation by improving the precision of the substrate location. CONSTITUTION: A transporting stage includes a first stage(14), a second stage(16), and a third stage. The first stage is transported to the X-direction. The second stage is transported to the Y-direction. The third stage is rotated at theta direction. The third stage determines a substrate location supported by chucks(10a, 10b). A plurality of laser displacement meters(42, 43) measures the displacements of the chucks at a plurality of positions. Based on the measured result of the laser displacement meters, the slope of the chuck is detected.</p>
申请公布号 KR20100105425(A) 申请公布日期 2010.09.29
申请号 KR20100022796 申请日期 2010.03.15
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 MORI JUNICHI;MATSUYAMA KATSUAKI;HIKAWA HIROSHI;HARA YASUHIKO
分类号 H01L21/027 主分类号 H01L21/027
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