发明名称 SEMICONDUCTOR DEVICE FABRICATION METHOD
摘要 <p>PURPOSE: A method for manufacturing a semiconductor device is provided to protect a chip from energy of a channel region applied by a laser when a substrate is separated. CONSTITUTION: An oxide film(105) with a first band gap is formed on a substrate(101) with a chip interval. A plurality of compound semiconductor layers with a second band gap is formed on the substrate. The second band gap is higher than the first band gap. A second electrode member is formed on the compound semiconductor. The substrate is separated by irradiating a laser on the substrate. The substrate is divided with a chip size.</p>
申请公布号 KR20100103981(A) 申请公布日期 2010.09.29
申请号 KR20090022086 申请日期 2009.03.16
申请人 LG INNOTEK CO., LTD. 发明人 JEONG, HWAN HEE
分类号 H01L33/12 主分类号 H01L33/12
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