ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

An illumination system for a microlithographic projection exposure apparatus includes a mirror arranged in a multi-mirror array and capable of being tilted via at least one actuator. The illumination system also includes drive electronics, which include a coarse digital-to-analogue converter with a first resolution, and a fine digital-to-analogue converter with a second resolution, and an adder. The second resolution is higher than the first resolution. The adder can add output quantities that are output by the two digital-to-analogue converters to yield an overall quantity that is capable of being applied at least indirectly to the at least one actuator of the mirror.