Plasma processing apparatus

摘要

A plasma processing apparatus performs plasma processing on a processing target in a processing chamber. The apparatus includes: an object to be heated provided near a periphery of a mounting table (110a) disposed in the processing chamber; and a heating electrode (135) disposed adjacent to the periphery of the mounting table, for heating the object to be heated. A first coil (135a1) having a first path and a second coil (135a2) having a second path are wired close to each other in the heating electrode along the periphery of the mounting table.