APPARATUS AND METHOD OF WAFER ALIGNMENT

摘要

PURPOSE: A wafer alignment apparatus and a wafer alignment method are provided to correctly align the location of wafers regardless of the thermal expansion of a camera supporting part. CONSTITUTION: A work table(13) supports wafers to be inspected. A stage supports the work table and transfers the wafers to vertical and horizontal directions. The stage rotates the wafers in a theta axis direction. A main camera(24) is installed to be opposite to the work table and takes images from the wafers. An auxiliary camera(25) is installed to be opposite to the work table. A controller(26) processes information related to the images in order to control the stage.