发明名称 APPARTUS AND METHOD FOR TREATING SUBSTRATES
摘要 PURPOSE: A substrate processing apparatus and a processing method thereof are provided to prevent nozzle pipes from being twisted. CONSTITUTION: A process chamber provides a space for processing a substrate. A substrate transfer unit is arranged inside the process chamber and transfers the substrate. A chemical distributing unit(130) distributes the chemical in both directions. First and second nozzle pipes(120a,120b) supplies the chemical to the substrate loaded on the substrate transfer unit.
申请公布号 KR20100104278(A) 申请公布日期 2010.09.29
申请号 KR20090022595 申请日期 2009.03.17
申请人 SEMES CO., LTD. 发明人 LEE, BONG MOON;PARK, TAE HYUN
分类号 H01L21/302;B05B1/00;G02F1/13 主分类号 H01L21/302
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