| 发明名称 |
Lithographic apparatus and device manufacturing method having liquid evaporation control |
| 摘要 |
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
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| 申请公布号 |
US7804575(B2) |
申请公布日期 |
2010.09.28 |
| 申请号 |
US20050205325 |
申请日期 |
2005.08.17 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
CADEE THEODORUS PETRUS MARIA;JACOBS JOHANNES HENRICUS WILHELMUS;TEN KATE NICOLAAS;LOOPSTRA ERIK ROELOF;VERMEER ASCHWIN LODEWIJK HENDRICUS JOHANNES;MERTENS JEROEN JOHANNES SOPHIA MARIA;DE MOL CHRISTIANUS GERARDUS MARIA;MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS;VAN DER NET ANTONIUS JOHANNUS;OTTENS JOOST JEROEN;QUAEDACKERS JOHANNES ANNA;REUHMAN-HUISKEN MARIA ELISABETH;STAVENGA MARCO KOERT;TINNEMANS PATRICIUS ALOYSIUS JACOBUS;VERHAGEN MARTINUS CORNELIS MARIA;VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS;DE JONG FREDERIK EDUARD;GOORMAN KOEN;MENCHTCHIKOV BORIS;BOOM HERMAN;NIHTIANOV STOYAN;MOERMAN RICHARD;SMEETS MARTIN FRANS PIERRE;SCHOONDERMARK BART LEONARD PETER;JANSSEN FRANCISCUS JOHANNES JOSEPH;RIEPEN MICHEL |
| 分类号 |
G03B27/52;G03F7/20 |
主分类号 |
G03B27/52 |
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