发明名称 EUV reticle handling system and method
摘要 An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.
申请公布号 US7804583(B2) 申请公布日期 2010.09.28
申请号 US20080242050 申请日期 2008.09.30
申请人 NIKON CORPORATION 发明人 PHILLIPS ALTON H.;SOGARD MICHAEL R.;WATSON DOUGLAS C.
分类号 G03B27/62;G03B27/52 主分类号 G03B27/62
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