发明名称 Mask for light exposure
摘要 Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.
申请公布号 US7803501(B2) 申请公布日期 2010.09.28
申请号 US20060417247 申请日期 2006.05.04
申请人 NEC LCD TECHNOLOGIES, LTD. 发明人 NAKATA SHINICHI;ISHINO TAKAYUKI;YAMASHITA MASAMI
分类号 G02F1/13;G03F1/00;G03F1/08;G03F1/14;G03F1/70;G03F7/00;G03F7/20;G03F9/00;H01L21/027 主分类号 G02F1/13
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