发明名称 |
Film pattern forming method, device, electro-optical apparatus, and electronic appliance |
摘要 |
A method for forming a film pattern by disposing a functional fluid on a substrate, includes: forming a partition wall that includes a first opening that corresponds to a first film pattern and a second opening that corresponds to a second film pattern; and disposing a droplet of the functional fluid into the first opening, so that the functional fluid is disposed into the second opening by a self-flow of the functional fluid; wherein: the first film pattern is linear; the second film pattern is narrower than the first film pattern, and is connected to the first film pattern at a rear edge thereof; and a front edge of the second film pattern has a missing part in which a corner of a rectangular contour is missing.
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申请公布号 |
US7803515(B2) |
申请公布日期 |
2010.09.28 |
申请号 |
US20060556384 |
申请日期 |
2006.11.03 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU;MORIYA KATSUYUKI |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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