发明名称 Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof
摘要 Disclosed herein may be a photosensitive composition, a microfabricated structure including the same, a device including the microfabricated structure, and methods of fabricating the microfabricated structure and the device. The photosensitive composition, including a multifunctional photosensitive resin, a two-photon photosensitizer, an organic solvent, and a silver compound, may be subjected to two- or three-dimensional microfabrication, thus realizing the microfabricated structure containing silver nanoparticles.
申请公布号 US7803514(B2) 申请公布日期 2010.09.28
申请号 US20080230221 申请日期 2008.08.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK JONG JIN
分类号 G03C1/76;G03C1/492;G03C1/494;G03C5/00;G03C5/44 主分类号 G03C1/76
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