| 摘要 |
An exposure apparatus that exposes a substrate to a pattern of an original. An illumination optical system illuminates the original. A projection optical system projects the pattern that is illuminated by the illumination optical system onto the substrate. A vacuum chamber houses at least one of the illumination optical system and the projection optical system. A heat absorber, arranged in the vacuum chamber, absorbs heat in the vacuum chamber. A heat conductor includes a metal member and connects the heat absorber and a wall of the vacuum chamber. The metal member is softer than the heat absorber and the wall, and fills a space between the heat absorber and the wall, and a cooler, arranged outside the vacuum chamber, cools the wall.
|
