发明名称 |
Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product |
摘要 |
A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal.
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申请公布号 |
US7804579(B2) |
申请公布日期 |
2010.09.28 |
申请号 |
US20070812817 |
申请日期 |
2007.06.21 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOOPSTRA ERIK ROELOF;VAN DER PASCH ENGELBERTUS ANTONLUS FRANSISCUS;VAN DER WIJST MARC WILHELMUS MARIA |
分类号 |
G03B27/42;G01B11/00;G01B11/14;G03B27/32;G03B27/58 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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