| 摘要 |
<p>PURPOSE: A developing apparatus, a developing method, and a storage media are provided to suppress the generation of developing defects by uniformly applying a developing solution on a substrate. CONSTITUTION: A substrate(W), which is processed with an exposure operation, is horizontally maintained by a substrate maintaining unit. A surface treatment solution atomization unit(40) atomizes a surface treatment solution in order to increase the wettability of a developing solution with respect to the substrate. A first spraying nozzle(41) sprays the atomized surface treatment solution on the substrate. A developing solution atomization unit atomizes the developing solution. A second spraying nozzle(51) sprays the atomized developing solution with respect to the substrate.</p> |
