SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM

摘要

PURPOSE: A substrate processing apparatus, a substrate processing method, a coating and developing apparatus, a coating and developing method, and a storage media are provided to prevent the generation development defects by uniformly supplying a developing solution on a substrate. CONSTITUTION: A substrate(W) is undergone through an exposure process. A heating plate(31) heats the exposed substrate. A surface processing solution atomization unit(60) atomizes a surface processing solution in order to improve the wettability of the substrate. A cooling unit(15) cools the heat substrate. The surface processing solution supplying unit supplies the atomized surface processing solution to the substrate.